M09000 - SEMI M90 - Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy After Preferential Etching StdPbc-1017 EtherNet/IP recommends the use of

EtherNet/IP recommends the use of commercial switch technology

The purpose of this Guide is to minimize the negative impact on productivity caused by static charge and electric fields in semiconductor manufacturing environments

but are not limited to

Materials kinds or cleanliness are not defined

Subordinate Standards:

M09000 - SEMI M90 - Test Method for Bulk Micro Defect Density and Denuded Zone Width in Annealed Silicon Wafers by Optical Microscopy After Preferential Etching StdPbc-1017 EtherNet/IP recommends the use ofThis Standard defines the measurement method for bulk micro defect (BMD) densities and denuded zone (DZ) width in annealed silicon wafers. This Standard describes the preferential etching technique to measure BMD density and DZ width. The BMD and DZ width are one of important characteristic parameters of annealed wafer which has meant the gettering capability. This Standard defines measurement technique of BMD density and DZ width. BMD and DZ form in