P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks Revision:SEMI P29-0997 - Superseded refurbishment

refurbishment

This Test Method is used to validate three main performance characteristics of RF generators in order to support the following SEMI E113 specifications:

and in some cases the identity of microscopic surface defects and contaminants that may appear on the wetted surfaces

1-0703 (technical revision)

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P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks Revision:SEMI P29-0997 - Superseded refurbishmentThis Specification covers the characteristics specific to attenuated phase shift masks and mask blanks. Referenced SEMI Standards SEMI P1 Specification for Hard Surface Photomask Substrates SEMI P2 Specification for Chrome Thin Films for Hard Surface Photomasks SEMI P22 Guideline for Photomask Defect Classification and Size Definition SEMI P28 Specification for Overlay Metrology Test Patterns for Integrated Circuit Manufacture