P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Revision:SEMI P45-0708 - Superseded This Standard specifies the measurement

This Standard specifies the measurement method of polarizing films and other films for FPD by using contour matching method

mean cycles between failures (MCBF)

3  This Guide also applies to wafers or other geometrical shapes of any material type that show deflections more than 200% of the allowable bow tolerance when tested for bow using the conventional three-point mounting method

this Standard provides:

SEMI M79-0623 (technical revision)

P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Revision:SEMI P45-0708 - Superseded This Standard specifies the measurementglobal Micropatterning Committee2008513global Audits and Reviews Subcommittee20086www. semi. org20087CD ROM20063 MALY Referenced SEMI Standards SEMI P39 OASISTM Open Artwork System Interchange Standard SEMI P44 Specification for Open Artwork System Interchange Standard (OASISTM) Specific to Mask Tools