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SEMI M10-0218 (technical revision)
これらの用語は，主にFPDを製造するのに使用するフォトマスクに適用される。
The pellicle exclusion volumes of this Specification accommodate pellicles which extend the full length of the reticles
and review data management
· Adjustable speed drives
M06700 - SEMI M67 - 測定した厚さデータ配列からESFQR，ESFQD，ESBIR METRICS法を使ってウェーハのエッジ近傍形状を決定するための作業方法 StdTpc-Reticle Data Management SEMI M10-0218 (technical revision)global Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM200611200811 ESFQRESFQDESBIR metricSFQRSFQDSBIRESFQRESFQDESBIRSFQRSFQD ZDD ROA PSFQR Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M59 Terminology for Silicon Technology SEMI M68 Practice for Determining Wafer Near Edge Geometry from a
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