MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-81 (Reapproved 2003) - Superseded SEMI D20 — Terminology for

SEMI D20 — Terminology for FPD Mask Defect

This Standard applies to mass flow controllers for gases used in semiconductor fabrication equipment

SEMI F49-0200 (Reapproved 1021)

It may be applied to subsystems of other multi-resource equipment

Precision statements have been established for each in the case of the five-point method applied to flatted wafers

MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-81 (Reapproved 2003) - Superseded SEMI D20 — Terminology forDimensional measurements made with an optical microscope are made on the optical image of the specimen and not directly on the specimen itself. The method of illuminating the specimen affects the image content, including the appearance of edges which are used in defining the size of the specimen. This Practice includes adjusting the microscope for Kohler illumination, which provides uniform illumination of the specimen, reduces stray light, and